J-FAST, a new Franco-Japanese laboratory for Materials Physics and Microelectronics

The J-FAST laboratory associates the University of Tsukuba in Japan, where it is also located, and in France, Université Grenoble Alpes (UGA) and CNRS via a consortium of several laboratories in the Grenoble region, such as the Néel Institute (CNRS), the Microelectronics Technology Laboratory (CNRS/UGA), and the Spintec laboratory [1] (CNRS/UGA/CEA). Supported by the industrialist Air Liquide, J-FAST is a strong axis of the strategic partnership that UGA has maintained with the University of Tsukuba since 1997.

The scientific program of J-FAST is mainly focused on the etching and selective growth of semiconductors for applications in microelectronics and optoelectronics.

This laboratory benefits from the complementary expertise of each partner and in particular from Air Liquide’s know-how in the field of precursor chemistry for the deposition and etching of materials. Although many questions are still at the exploratory research stage, the work carried out at J-FAST will make it possible to improve the technology of power electronics or LED screens, for example. Other major topics will be explored around spintronics and quantum engineering.

The strength of this multidisciplinary partnership is that it is working to provide answers to the current challenges of developing manufacturing processes for energy and material-saving devices, on the road to sustainable and frugal electronics.